Scholarlink

<p>The surface texturing of monocrystalline silicon (mono-Si) plays a vital role in enhancing light absorption and reducing reflectance for high-efficiency solar cells. In this work, we present a sustainable alternative utilizing tetramethylammonium hydroxide (TMAH), isopropyl alcohol (IPA), and deionized water (DI) in the ratio of 1:1:17 for alkaline etching. After that, metal assisted-based etchants, such as 0.1&#xa0;M AgNO<sub>3</sub> and (0.5&#xa0;M, 1&#xa0;M, and 1.5&#xa0;M) HF, are used for surface modification of mono-Si wafers for 15&#xa0;min. The optimized process (1&#xa0;M HF) produced uniform micro pyramidal structures that reduced average reflectance from 30.1% to 6.7% and increased simulated photovoltaic efficiency from 14.6% to 20.3%. Field Emission Scanning Electron Microscopy (FESEM) and optical microscopy confirmed well-defined micro-pyramidal, while X-Ray Diffraction (XRD) analysis verified the preservation of crystalline integrity. Minority carrier lifetime measurements indicated manageable recombination losses consistent with enhanced optical performance. This low-temperature, cost-effective, and environmentally benign approach provides a scalable route for broadband antireflection and improved photovoltaic performance, offering a novel and practical strategy for sustainable, high-efficiency silicon solar cell manufacturing.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Surface Texturing of Mono-Crystalline Silicon Wafer Using TMAH and Metal Assisted Etching for the Photovoltaic Industry

  • 期刊论文

  • 发表日期：

    2026年2月13日

查看全文
  • Gokul Jayavel,
  • Mariyappan Raman,
  • Srinivasan Manickam,
  • Ramasamy Perumalsamy

摘要

The surface texturing of monocrystalline silicon (mono-Si) plays a vital role in enhancing light absorption and reducing reflectance for high-efficiency solar cells. In this work, we present a sustainable alternative utilizing tetramethylammonium hydroxide (TMAH), isopropyl alcohol (IPA), and deionized water (DI) in the ratio of 1:1:17 for alkaline etching. After that, metal assisted-based etchants, such as 0.1 M AgNO3 and (0.5 M, 1 M, and 1.5 M) HF, are used for surface modification of mono-Si wafers for 15 min. The optimized process (1 M HF) produced uniform micro pyramidal structures that reduced average reflectance from 30.1% to 6.7% and increased simulated photovoltaic efficiency from 14.6% to 20.3%. Field Emission Scanning Electron Microscopy (FESEM) and optical microscopy confirmed well-defined micro-pyramidal, while X-Ray Diffraction (XRD) analysis verified the preservation of crystalline integrity. Minority carrier lifetime measurements indicated manageable recombination losses consistent with enhanced optical performance. This low-temperature, cost-effective, and environmentally benign approach provides a scalable route for broadband antireflection and improved photovoltaic performance, offering a novel and practical strategy for sustainable, high-efficiency silicon solar cell manufacturing.