Performance Improvement of Nanowire TFET by Using Different Ferroelectric Semiconductor Structures
摘要
The nanowire gate-all-around structure with the highest channel electrostatic integrity shows the best resistance to short channel effects and improved scaling compared to other multi-gate systems and capacity. We present a multistructure study of the impact of a gate-all-around nanowire tunnelling field on a transistor to enhance the drain current. This work describes ferroelectric nanowire tunnel field-effect transistors operating at VDS = 0.5 V, well below the 20 mV/decade switching characteristics. Compared to traditional Nanowire tunnel field effect transistors, the suggested device performs better with a high ION-IOFF ratio, lower subthreshold swing, and enhanced driving current. The proposed devices have a 1000 times better ION-IOFF ratio than conventional NWTFET. The suggested devices are examined, including conductance, potential, energy band diagram, transfer and output properties, and other aspects for analog applications.