Synthesis and Ameliorating the Features of PVA-CS/SiO2-WC Futuristic Films For Pressure Sensor Applications
摘要
This study aims to improve the dielectric and structural properties of polyvinyl alcohol (PVA)/chitosan(CS)/silicon dioxide (SiO2)/tungsten carbide (WC) nanostructures for flexible pressure sensor application. The (PVA-CS/SiO2-WC) films were fabricated by utilizing casting process. The results indicated that high distribution of SiO2-WC NPs inside the PVA-CS medium and excellent incorporation between SiO2-WC NPs and PVA-CS matrix. The dielectric properties findings showed that an increase in the dielectric parameters of PVA-CS with an increase in the SiO2-WC nanoparticles content. The dielectric constant(ε′) and (σA.C) of PVA-CS increased about 58% and 66.5% with low values of dielectric loss(ε′′) ranged from 0.193 to 0.581 at 100 Hz, this result indicates that the (PVA-CS/SiO2-WC) nanocomposites are suitable for diverse nanoelectronics applications. The dielectric characteristics of (PVA-CS/SiO2-WC) nanocomposites were changed with an increase in frequency. The final results showed the PVA-CS/SiO2-WC nanostructures exhibit superior pressure sensitivity, exceptional flexibility, and strong environmental resilience compared with other sensors.