Radiation-Stimulated Transformation of Cxygen Atoms Between Impurity Phase States of A Growing Silicon Single Crystal
摘要
The X-ray diffraction method confirmed the presence of a three-phase state of oxygen in a growing single crystal of silicon grown by the Czochralski method: a state freely dissolved along the interstices of the matrix lattice in the form of “quasi-molecules”—SiO2 and a precipitate state in the composition of crystalline silicon dioxide—SiO2(c) in the volume of the sample, and on surface of a single crystal in the amorphous form of dioxide – SiO2(a). The radiation-stimulated transformation of oxygen atoms between dissolved and crystalline impurity phase states of oxygen in the bulk of a single crystal has been established. A new physical mechanism for the stability of the intrinsic (diamond-like) crystal structure of a growth silicon single crystal to neutron irradiation is proposed.