Genetic algorithms based subaperture stitching approach for metrology application
摘要
The stitching of subaperture wavefront profiles is a prominent technique for freeform and large size optical wavefront metrology. The measurements of wavefront in small areas with suitable techniques are carried out and for stitching those wavefronts, the stitching coefficients are determined by error minimization using least square method. In this work an alternative approach for optimization of the stitching coefficients are investigated using genetic algorithms (GA). For the study, two types of measurement data viz. interferometric measurement of subaperture profiles of the plane wavefront and scanning Shack Hartmann sensor (SHS) based subaperture profiles measurement of freeform wavefronts are used. The stitched profile for plane wavefront using GA technique is 41.73 wave (peak to valley) [ 1 wave = 632.8 nm], which exactly matched with the nominal value of plane wavefront profile without any error. For freeform wavefront subaperture stitching, the residual error has been decrease to 0.19 wave as compared to 4.2 wave in case of the least square minimization stitching technique. The results are encouraging and the technique has potential to be used for stitching of the subaperture measurements.