Refractive indices equations of silicon dioxide for optical simulations
摘要
As SiO2 films are used in many electronic and optical devices, it is vital to investigate their optical refractive indices. In this study, the refractive index of SiO2 is collected, discussed, and fitted at different physical, geometrical, and deposition conditions for optical simulations. We focused on the wavelength range up to 7.50 µm because the extinction coefficient in this range is close to zero. The refractive indices of SiO2 are fitted at different temperatures, glancing angle deposition, deposition pressure, concentrations of SiO2 nanoparticles, thicknesses, laser power, substrates, time placed in the air at room temperature, thermal annealing temperatures, annealing time, and reactive gas flow rate. This mixed study generates newly fitted equations in Sellmeier form for the refractive index of SiO2 that can be powerfully used in modeling studies. By developing fitted equations, plotted curves, and MATLAB codes for SiO2 refractive indices, this study significantly reduces modeling errors, enhancing the accuracy and reliability of optical simulations and designs.