Nonlinear third-order characteristics and optical limiting of rhodamine B-PMMA doped films with varying concentrations using the Z-scan technique
摘要
A study was conducted on the nonlinear characteristics of Rhodamine B (Rh B) doped with the poly methyl methacrylate (PMMA) using the Z-scan technique with both closed and open aperture. Different concentrations of Rhodamine B thin films were prepared using the casting method. The nonlinear absorption, nonlinear refraction, optical limiting, and third-order susceptibility of the prepared samples were studied under the influence of the 650 nm diode laser. The results showed that the samples exhibited self-defocusing, with a negative nonlinear refractive index (n2) is approximate of 10–6 cm2 /watt for the three concentrations. Additionally, the prepared samples exhibited two-photon absorption, in which the nonlinear absorption coefficient (β) ranged between 0.55