Influence Of Laser Energy On Structural And Optical Properties Of ZnO_(x):NiO_(1−x) Films PreparedBy PulseLaser Deposition

The current study illustrates the ZnO_(x):NiO_(1−x) thin film synthesis using pulsed laser deposition at two different energy levels, 800 and 1000 mJ. The characteristics of the synthesized ZnO-NiO mixture were determined. XRF analysis obviously proved the presence of ZnO and NiO in thin film, with a high concentration ratio of Zn to Ni, suggesting minimal loss of these elements during the preparation process. The formation of the ZnO_(x): NiO_(1−x) thin film was achieved successfully and confirmed by characterization techniques. Peaks corresponding to hexagonal face-centered ZnO at 100, 002, 101, and 102° planes and cubic face-centered NiO at 111 and 200° were observed in XRD patterns. A comparison between the energy levels and their impact on the properties of the mixture, as determined by XRD and AFM analysis, indicated a reduction in particle size with increased energy, as well as a decrease in the values of root mean square (RMS) and average roughness. Additionally, optical properties showed an increase in absorbance with higher energy levels and the value of energy gap 3.85 for energy level 1000 mJ and 4.1 for 800 mJ.