Formation of Multiscale Porous Surfaces via Evaporation-Induced Aggregation of Imprinted Nanowires with Highly Viscous Photocurable Materials
摘要
Numerous structures at the nano and microscale manifest distinctive properties with far-reaching implications across diverse fields, including electronics, electricity, medicine, and surface engineering. Established methods such as nanoimprint lithography, photolithography, and self-assembly play crucial roles in the fabrication of nano- and microstructures; however, they exhibit limitations in generating high-aspect-ratio structures when utilizing high-viscosity photocurable resins. In response to this inherent challenge, we propose a highly cost-effective approach facilitating the direct replication of high-aspect-ratio structures, specifically nanowires, through the utilization of anodized aluminum substrates. This study elucidates the streamlined fabrication process for multiscale porous surfaces achieved through the evaporation-induced integration of solid nanowires printed with high-viscosity photocurable resin.