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<p>The TC4 solar interface evaporator’s photocatalytic and corrosion performance needs to be improved. The effects of ion power and film thickness on the TiO<sub>2</sub> film’s functions were studied using magnetron sputtering. The results showed that high current reduced roughness and changed the phase from mixed anatase/rutile to anatase owing to high particle bombardment, reducing the specific surface area and thereby decreasing TiO<sub>2</sub>’s photocurrent densities and improving corrosion resistance. The films' roughness decreased from − 30&#xa0;V to − 90&#xa0;V, again owing to the high ion bombardment. The bias voltage of − 120&#xa0;V was too high to maintain a defect-free surface because of the resputtering effect. The photocurrent densities decreased, and corrosion resistance hardly changed with increases in the bias voltage up to − 90&#xa0;V and with extended deposition time. In other words, the corrosion resistance was not affected by the film’s roughness when the film was thick enough. The increase in film thickness enhanced photocatalytic performance and the corrosion resistance, owing to the high specific surface area and large TiO<sub>2</sub> volume that generate photoelectrons, and the long physical barrier path against corrosive media, respectively. Here, optimal performance was achieved with suitable ion power (2 A, − 30&#xa0;V) and film thickness (332&#xa0;nm).</p>

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TiO2’s Structure and Functions Related to the Film Thickness and Ion Power by Magnetron Sputtering

  • 期刊论文

  • 发表日期：

    2026年4月2日

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  • Zhiwei Su,
  • Caibo Yan,
  • Tingdong Ren,
  • Yanwen Zhou

摘要

The TC4 solar interface evaporator’s photocatalytic and corrosion performance needs to be improved. The effects of ion power and film thickness on the TiO2 film’s functions were studied using magnetron sputtering. The results showed that high current reduced roughness and changed the phase from mixed anatase/rutile to anatase owing to high particle bombardment, reducing the specific surface area and thereby decreasing TiO2’s photocurrent densities and improving corrosion resistance. The films' roughness decreased from − 30 V to − 90 V, again owing to the high ion bombardment. The bias voltage of − 120 V was too high to maintain a defect-free surface because of the resputtering effect. The photocurrent densities decreased, and corrosion resistance hardly changed with increases in the bias voltage up to − 90 V and with extended deposition time. In other words, the corrosion resistance was not affected by the film’s roughness when the film was thick enough. The increase in film thickness enhanced photocatalytic performance and the corrosion resistance, owing to the high specific surface area and large TiO2 volume that generate photoelectrons, and the long physical barrier path against corrosive media, respectively. Here, optimal performance was achieved with suitable ion power (2 A, − 30 V) and film thickness (332 nm).