<p>Doping active elements into the adhesive layer effectively inhibits the formation of brittle phases, such as spinel, and enhances the coating's high-temperature oxidation resistance. In this study, a NiCoCrAlY-nano-HfO<sub>2</sub> coating was fabricated using laser cladding technology. The effect of nano-HfO<sub>2</sub> doping on the oxidation behavior of NiCoCrAlY coatings was investigated at 1100&#xa0;°C. The results show that nano-HfO<sub>2</sub> doping improves the hardness of the cladding layer. Initially, at high temperatures, nano-HfO<sub>2</sub> doping promotes the selective oxidation of the alumina film. During oxidation, hafnium oxide diffuses into the vicinity of the oxide film, promoting the formation of an oxide pinning structure, which improves the exfoliation resistance of the oxide film. Additionally, the large size and low solubility of HfO<sub>2</sub> result in its distribution at the interface between the two phases, inhibiting Al diffusion, limiting oxide film growth, delaying the formation of the spinel phase in the oxide film, reducing the growth rate of the thermally grown oxide (TGO), and enhancing the high-temperature oxidation resistance of the coating.</p>

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High-Temperature Oxidation Properties of Nano-HfO2-Doped NiCoCrAlY Coatings Prepared by Laser Cladding Technology

  • Jialong Han,
  • Haizhong Zheng,
  • Yongxiang Geng,
  • Yixin Xiao,
  • Xin Wang

摘要

Doping active elements into the adhesive layer effectively inhibits the formation of brittle phases, such as spinel, and enhances the coating's high-temperature oxidation resistance. In this study, a NiCoCrAlY-nano-HfO2 coating was fabricated using laser cladding technology. The effect of nano-HfO2 doping on the oxidation behavior of NiCoCrAlY coatings was investigated at 1100 °C. The results show that nano-HfO2 doping improves the hardness of the cladding layer. Initially, at high temperatures, nano-HfO2 doping promotes the selective oxidation of the alumina film. During oxidation, hafnium oxide diffuses into the vicinity of the oxide film, promoting the formation of an oxide pinning structure, which improves the exfoliation resistance of the oxide film. Additionally, the large size and low solubility of HfO2 result in its distribution at the interface between the two phases, inhibiting Al diffusion, limiting oxide film growth, delaying the formation of the spinel phase in the oxide film, reducing the growth rate of the thermally grown oxide (TGO), and enhancing the high-temperature oxidation resistance of the coating.