HiPIMS-Cr Bombardment as an Alternative to Ar-Pretreatment for Enhancing TiAlN-Coating Adhesion on Steel Substrates
摘要
Achieving strong coating–substrate adhesion is essential for ensuring the long-term reliability of thin films, particularly in demanding service conditions. High-chromium steels such as H13, D2, and D3 present a challenge for Physical Vapor Deposition (PVD) coatings, as persistent surface oxides and impurities are not effectively removed by conventional argon (Ar) bombardment. To address this limitation, this study explores an alternative pretreatment approach in which a chromium (Cr) target is operated in High Power Impulse Magnetron Sputtering (HiPIMS) mode while steel substrates are simultaneously biased in Direct Current (DC) mode. Following pretreatment, Ti/TiN/TiAlN multilayer coatings were deposited using Direct Current Magnetron Sputtering (DCMS). The resulting coatings were extensively characterized using Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), X-Ray Diffraction (XRD), three-dimensional profilometry, nanoindentation, Rockwell adhesion, and scratch testing to assess the effect of pretreatment. HiPIMS-Cr bombardment produced a ~ 700 nm Cr interlayer that improved diffusion bonding and created a rougher interface, encouraging mechanical interlocking. Coatings grown on HiPIMS-Cr pretreated substrates exhibited competitive (111), (200), and (220) orientations, with hardness slightly reduced (25.3 GPa) compared to Ar-bombarded coatings (27.5 GPa). Scratch testing demonstrated higher critical loads (Lc3): 36% for D2, 16% for D3, and 15% for H13. Overall, HiPIMS-Cr pretreatment enhances surface cleaning, chemical bonding, and mechanical interlocking, providing a promising strategy to improve the durability and reliability of hard coatings on high-alloy steels.