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<p>The effect of substrate-level magnetic flux and its influence on the plasma geometry in tailoring the structural and magnetic orientations of Pt/Co/Pt multilayer thin films is investigated. Films were deposited at room temperature by DC magnetron sputtering with and without an externally applied magnetic field of 3000 G generated at the poles of a permanent NdFeB magnet placed beneath the substrate. The additional magnetic flux significantly alters the plasma geometry, leading to enhanced plasma confinement and increased ion density near the substrate surface. X-ray diffraction shows that films deposited without magnetic flux exhibit only Pt reflections in the as-deposited state, whereas magnetic-flux-assisted deposition results in the direct formation of the ordered L1<sub>0</sub> CoPt phase with a pronounced (110) superlattice reflection. After annealing at 600&#xa0;°C for 6&#xa0;h, both films transform into the L1<sub>0</sub> CoPt phase with an average crystallite size of 20&#xa0;nm; however, films deposited without flux develop a dominant (001) texture, while those grown under magnetic flux retain strong (110) texturing. A 500% orientation degree was achieved along (110) for the magnetic-flux-assisted films comparative to 200% along (001) for conventional films. The elemental mapping analysis reveals a uniform distribution of Co and Pt atoms with an atomic stoichiometry of Co<sub>44</sub>Pt<sub>56</sub> estimated by the EDX spectrum. Magnetic measurements reveal stable in-plane magnetization and a characteristic wasp-waisted hysteresis loop for magnetic-flux-assisted films, indicative of pinning-dominated magnetization reversal, whereas higher coercivity of 11,500 Oe is observed for the (001)-oriented films deposited without flux. These results demonstrate that magnetic-flux-assisted sputtering provides an effective approach for controlling crystallographic orientation and magnetic anisotropy in L1<sub>0</sub> CoPt thin films, offering new possibilities for tailoring materials for magnetic recording applications.</p>

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Role of Plasma Geometry in the Growth of L10 CoPt Films and Its Influence on Texture Evolution and Magnetic Anisotropy

  • 期刊论文

  • 发表日期：

    2026年4月7日

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  • Neeru Sehdev,
  • Rakesh Malik,
  • S. Annapoorni

摘要

The effect of substrate-level magnetic flux and its influence on the plasma geometry in tailoring the structural and magnetic orientations of Pt/Co/Pt multilayer thin films is investigated. Films were deposited at room temperature by DC magnetron sputtering with and without an externally applied magnetic field of 3000 G generated at the poles of a permanent NdFeB magnet placed beneath the substrate. The additional magnetic flux significantly alters the plasma geometry, leading to enhanced plasma confinement and increased ion density near the substrate surface. X-ray diffraction shows that films deposited without magnetic flux exhibit only Pt reflections in the as-deposited state, whereas magnetic-flux-assisted deposition results in the direct formation of the ordered L10 CoPt phase with a pronounced (110) superlattice reflection. After annealing at 600 °C for 6 h, both films transform into the L10 CoPt phase with an average crystallite size of 20 nm; however, films deposited without flux develop a dominant (001) texture, while those grown under magnetic flux retain strong (110) texturing. A 500% orientation degree was achieved along (110) for the magnetic-flux-assisted films comparative to 200% along (001) for conventional films. The elemental mapping analysis reveals a uniform distribution of Co and Pt atoms with an atomic stoichiometry of Co44Pt56 estimated by the EDX spectrum. Magnetic measurements reveal stable in-plane magnetization and a characteristic wasp-waisted hysteresis loop for magnetic-flux-assisted films, indicative of pinning-dominated magnetization reversal, whereas higher coercivity of 11,500 Oe is observed for the (001)-oriented films deposited without flux. These results demonstrate that magnetic-flux-assisted sputtering provides an effective approach for controlling crystallographic orientation and magnetic anisotropy in L10 CoPt thin films, offering new possibilities for tailoring materials for magnetic recording applications.