Mechanical and Tribological Properties of TiAlN Coatings Deposited by HiPIMS with Parameters Optimized Using Taguchi Method
摘要
A high-power impulse magnetron sputtering (HiPIMS) system was employed to deposit TiAlN coatings on SKH51 substrates. The sputtering parameters were optimized using the robust Taguchi design methodology with substrate bias voltages of − 50, − 85, and − 120 V, Ti and Al target currents both set at of 250, 300, and 350 A, and N2/Ar flow rate ratios of 10/60, 15/55, and 20/50 sccm. According to the Taguchi results, the optimal deposition parameters were a substrate bias voltage of − 120 V, a Ti target current of 350 A, an Al target current of 250 A, and an N2/Ar flow ratio of 15/55 sccm. However, the coating sputtered with these parameters did not show significantly improved tribological properties. Thus, the Al target current was reduced to 100 A and the N2 flow rate was increased to 20 sccm. The lower aluminum and higher nitrogen contents of the resulting coating significantly enhanced the tribological performance.