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<p>316L stainless steel (316L SS) is widely used and studied under atmospheric pressure due to its excellent passivation performance. However, the properties of its passivation film under hydrostatic pressure remain poorly understood. In this study, the behavior of the passivation film on 316L SS was investigated at specific hydrostatic pressures of 0.1, 10, 20, and 30&#xa0;MPa and pH levels of 8.5, 9.5, and 10.5. Potentiodynamic polarization, potentiostatic polarization, electrochemical impedance spectroscopy (EIS), and Mott–Schottky tests were employed to analyze the breakdown potential and defect types of the passivation film. The results revealed that the breakdown potential of the passivation film under hydrostatic pressure followed a similar trend to that under atmospheric pressure, decreasing with increasing pH. Additionally, the steady-state current density increased under hydrostatic pressure, while the passivation film thickness decreased. A transition from N-type to P-type semiconductor behavior (N-P transition) was observed over a potential range of 0.2 to 0.3&#xa0;V. These findings provide new insights into the effects of hydrostatic pressure and pH on the passivation behavior of 316L SS.</p>

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Hydrostatic Pressure and pH Effect on Passivation of 316L Stainless Steel

  • 期刊论文

  • 发表日期：

    2026年1月27日

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  • Mingsi Yang,
  • Chi Zhan,
  • Heng Chen,
  • Shaoyuan Peng,
  • Feixiong Mao,
  • Lei Li

摘要

316L stainless steel (316L SS) is widely used and studied under atmospheric pressure due to its excellent passivation performance. However, the properties of its passivation film under hydrostatic pressure remain poorly understood. In this study, the behavior of the passivation film on 316L SS was investigated at specific hydrostatic pressures of 0.1, 10, 20, and 30 MPa and pH levels of 8.5, 9.5, and 10.5. Potentiodynamic polarization, potentiostatic polarization, electrochemical impedance spectroscopy (EIS), and Mott–Schottky tests were employed to analyze the breakdown potential and defect types of the passivation film. The results revealed that the breakdown potential of the passivation film under hydrostatic pressure followed a similar trend to that under atmospheric pressure, decreasing with increasing pH. Additionally, the steady-state current density increased under hydrostatic pressure, while the passivation film thickness decreased. A transition from N-type to P-type semiconductor behavior (N-P transition) was observed over a potential range of 0.2 to 0.3 V. These findings provide new insights into the effects of hydrostatic pressure and pH on the passivation behavior of 316L SS.