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<p>A high-entropy alloy (HEA) coating composed of AlCoCrFeNiCu was prepared by electron beam cladding; the effect of the electron beam focusing current on the phase, microstructure, and properties of the coating was studied by electron beam defocusing. The AlCoCrFeNiCu HEA coating was composed of biphasic face-centered cubic (FCC) dendrites and body-centered cubic (BCC) interdendritic. Upon increasing the focusing current, the dilution rate decreased, and the Fe content was controlled within the theoretical range for HEA formation. Moreover, the BCC content gradually increased, the FCC content gradually decreased, and the average hardness of the coating increased. The main wear mechanisms of the coating under different focusing currents were abrasive and oxidative wear. The wear resistance of the coating decreased upon increasing the focusing current, reaching its lowest and optimal value at 607&#xa0;mA.</p>

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Microstructure and Properties of AlCoCrFeNiCu High-Entropy Alloy Coating Prepared by Electron Beam Cladding

  • 期刊论文

  • 发表日期：

    2025年10月30日

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  • Wenqin Wang,
  • Jichun Zou,
  • Zhe Wang,
  • Xing Ran,
  • Weihua Zhong,
  • Wanhuan Yang,
  • Shen Li

摘要

A high-entropy alloy (HEA) coating composed of AlCoCrFeNiCu was prepared by electron beam cladding; the effect of the electron beam focusing current on the phase, microstructure, and properties of the coating was studied by electron beam defocusing. The AlCoCrFeNiCu HEA coating was composed of biphasic face-centered cubic (FCC) dendrites and body-centered cubic (BCC) interdendritic. Upon increasing the focusing current, the dilution rate decreased, and the Fe content was controlled within the theoretical range for HEA formation. Moreover, the BCC content gradually increased, the FCC content gradually decreased, and the average hardness of the coating increased. The main wear mechanisms of the coating under different focusing currents were abrasive and oxidative wear. The wear resistance of the coating decreased upon increasing the focusing current, reaching its lowest and optimal value at 607 mA.