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<p>To address the challenges in ultra-precision machining of the inner surface of aerospace micro-bearing outer rings, this study integrates chemical mechanical polishing (CMP) and jet polishing to design a novel chemical mechanical jet polishing (CMJP) device, achieving ultra-precision processing of the inner surface. First, single-factor experiments were conducted on the Cr4Mo4V material used for aerospace micro-bearing outer rings to optimize the polishing slurry formulation: 14 wt.% silica sol, 0.5 wt.% H<sub>2</sub>O<sub>2</sub>, 1 wt.% EDTA-2Na, 0.005 wt.% BTA, with pH maintained at 11. This formulation achieved an ultra-smooth planar surface with a surface roughness (Sa) of 1.067&#xa0;nm. Subsequent CMJP experiments using this optimized slurry and the newly developed device further optimized abrasive particle size (#1000 SiC) and polishing time (75&#xa0;min), ultimately yielding an inner surface with a surface roughness (Sa) of 66&#xa0;nm. Finally, XPS analysis elucidated the polishing mechanism: chromium was oxidized by H<sub>2</sub>O<sub>2</sub> to form Cr<sub>2</sub>O<sub>3</sub>, with partial Cr<sub>2</sub>O<sub>3</sub> combining with CO<sub>3</sub><sup>2−</sup> to produce Cr<sub>2</sub>(CO<sub>3</sub>)<sub>3</sub>; iron was oxidized to FeO, a portion of which was further oxidized to Fe<sub>2</sub>O<sub>3</sub>, while the remaining FeO underwent complexation with EDTA<sup>2−</sup> to form [Fe(EDTA)]<sup>2−</sup> complexes. The findings of this study provide a novel approach for the machining of internal surfaces in various types of bearing outer rings, holding significant potential for widespread application and promotion.</p>

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A Novel Approach of Chemical Mechanical Jet Polishing for Interior Surface of Aerospace Micro-bearing Outer Rings

  • 期刊论文

  • 发表日期：

    2025年10月2日

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  • Fanning Meng,
  • Yulong Dai,
  • Chunjing Shi,
  • Chun Cao,
  • Ying Yang,
  • Zeqiang Li

摘要

To address the challenges in ultra-precision machining of the inner surface of aerospace micro-bearing outer rings, this study integrates chemical mechanical polishing (CMP) and jet polishing to design a novel chemical mechanical jet polishing (CMJP) device, achieving ultra-precision processing of the inner surface. First, single-factor experiments were conducted on the Cr4Mo4V material used for aerospace micro-bearing outer rings to optimize the polishing slurry formulation: 14 wt.% silica sol, 0.5 wt.% H2O2, 1 wt.% EDTA-2Na, 0.005 wt.% BTA, with pH maintained at 11. This formulation achieved an ultra-smooth planar surface with a surface roughness (Sa) of 1.067 nm. Subsequent CMJP experiments using this optimized slurry and the newly developed device further optimized abrasive particle size (#1000 SiC) and polishing time (75 min), ultimately yielding an inner surface with a surface roughness (Sa) of 66 nm. Finally, XPS analysis elucidated the polishing mechanism: chromium was oxidized by H2O2 to form Cr2O3, with partial Cr2O3 combining with CO32− to produce Cr2(CO3)3; iron was oxidized to FeO, a portion of which was further oxidized to Fe2O3, while the remaining FeO underwent complexation with EDTA2− to form [Fe(EDTA)]2− complexes. The findings of this study provide a novel approach for the machining of internal surfaces in various types of bearing outer rings, holding significant potential for widespread application and promotion.