Optical and Electrical Properties of NiO/Al/NiO Conductive Multilayer Films
摘要
NiO/Al/NiO transparent conductive multilayer films were prepared on K9 glass substrates by magnetron sputtering at room temperature. The effects of different NiO and Al layers on the transmittance of visible light and the electrical resistivity characteristics for the three-layer films were investigated. The NiO/Al/NiO films are N-type transparent conductive films. Analysis shows that the thickness of the NiO and Al layers has a major impact on the films' properties. The transmittance of the film initially increases and then decreases as the thickness of NiO and Al layers increases. When the thickness of NiO and Al layers are respectively 35 nm and 12 nm, the multilayer film has better optical properties. The maximum transmittance is 85.3%, the film resistance is 3.11 Ω/sq, and the carrier concentration is 7.553 × 1021 cm3. The transmittance of the film was simulated by TFCalc software. The experimental value was greater than the calculated value in the long-wave range of the visible light region.