Influence of Transient Radiation on Tapping Effects in a Gate-Engineered AlGaN/GaN MOSHEMT
摘要
The investigation of single-event transient (SET) effects in a double-π-gate AlGaN/GaN metal–oxide–semiconductor high-electron-mobility transistor (MOSHEMT) is explored herein. The single-event effect (SEE) is a serious problem in Al0.27Ga0.73N/GaN MOSHEMTs under high linear energy transfer (LET) radiation (e.g., 47.36 MeV cm2/mg). In all circumstances tested, the recombination of electron–hole pairs neutralizes carriers created by SET, restoring the carrier concentration of the two-dimensional electron gas (2DEG) and drain current to normal values during the ON state. High-LET results reveal that increasing the LET has no significant impact on drain current collapse. The results suggest that heavy ion beams generate very few electron–hole pairs in the double-π-gate AlGaN/GaN MOSHEMT during both OFF and ON states. When the device is irradiated with a heavy ion beam, the large conduction band energy offsets remain unaffected. The proposed design effectively eliminates hot electron injection effects. The double-π-gate structure ensures a uniform peak electric field distribution. The results also reveal lower levels of SETs due to the presence of three parallel gate pillars.