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<p>Silicon nitride (SiN<sub><i>x</i></sub>) coatings are widely recognized for their excellent optical and electrical properties, making them a popular choice for anti-reflective and surface passivation layers in solar cell production. By introducing additional layers, such as titanium dioxide (TiO<sub>2</sub>) and silicon dioxide (SiO<sub>2</sub>), there is an opportunity to further enhance the performance of silicon nitride coatings. However, there is a clear need for comprehensive comparative analyses of these materials, especially in a hybrid structure. This study delves into the performance and functional characteristics of a 20-nm-thick SiN<sub><i>x</i></sub> layer with a top coating of TiO<sub>2</sub>, SiO<sub>2</sub>, and a TiO<sub>2</sub>-SiO<sub>2</sub> stack, all fabricated via the sol–gel method at a deposition temperature of 300°C. The hybrid TiO<sub>2</sub>-SiO<sub>2</sub> coating exhibits a mixed-phase structure with uniform crystallinity. Notably, the TiO<sub>2</sub>-SiO<sub>2</sub> coating achieves ultraviolet (UV) absorbance of 0.7 AU and the highest photocurrent density of 23&#xa0;mA/cm<sup>2</sup>. On the other hand, SiO<sub>2</sub>-coated SiN<sub><i>x</i></sub> demonstrates minimal absorbance at 0.1 with lower photocurrent of 13&#xa0;mA/cm<sup>2</sup>, and the TiO<sub>2</sub> hybrid coating displays UV absorbance of 0.6 AU and photocurrent density of 21&#xa0;mA/cm<sup>2</sup>. With optical band gap energies of 3.4&#xa0;eV for TiO<sub>2</sub>, 5&#xa0;eV for SiO<sub>2</sub>, and 5.4&#xa0;eV for TiO<sub>2</sub>-SiO<sub>2</sub>, along with a refractive index of 1.6, 1.4, and 1.5, respectively, these findings highlight the potential of these hybrid coatings in solar cell applications.</p>

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Hybrid Thin Film Coating Performance and Functional Characteristics of Silicon Nitride (SiNx) Layer for Solar Cell Application

  • 期刊论文

  • 发表日期：

    2025年4月2日

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  • R. Venkatesh,
  • Ravindra Pratap Singh,
  • Nagabhooshanam Nagarajan,
  • Vinayagam Mohanavel,
  • S. Prabagaran,
  • Muthurajan Subramoniam,
  • Manzoore Elahi M. Soudagar,
  • Sami Al Obaid,
  • Saleh Hussein Salmen

摘要

Silicon nitride (SiNx) coatings are widely recognized for their excellent optical and electrical properties, making them a popular choice for anti-reflective and surface passivation layers in solar cell production. By introducing additional layers, such as titanium dioxide (TiO2) and silicon dioxide (SiO2), there is an opportunity to further enhance the performance of silicon nitride coatings. However, there is a clear need for comprehensive comparative analyses of these materials, especially in a hybrid structure. This study delves into the performance and functional characteristics of a 20-nm-thick SiNx layer with a top coating of TiO2, SiO2, and a TiO2-SiO2 stack, all fabricated via the sol–gel method at a deposition temperature of 300°C. The hybrid TiO2-SiO2 coating exhibits a mixed-phase structure with uniform crystallinity. Notably, the TiO2-SiO2 coating achieves ultraviolet (UV) absorbance of 0.7 AU and the highest photocurrent density of 23 mA/cm2. On the other hand, SiO2-coated SiNx demonstrates minimal absorbance at 0.1 with lower photocurrent of 13 mA/cm2, and the TiO2 hybrid coating displays UV absorbance of 0.6 AU and photocurrent density of 21 mA/cm2. With optical band gap energies of 3.4 eV for TiO2, 5 eV for SiO2, and 5.4 eV for TiO2-SiO2, along with a refractive index of 1.6, 1.4, and 1.5, respectively, these findings highlight the potential of these hybrid coatings in solar cell applications.