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<p>Plasmon-engineered dielectric nanocomposites are promising materials for enhancing nonlinear optical (NLO) responses. With the rapid advancement of high-intensity laser technologies, there is a growing demand for efficient optical limiting systems to safeguard sensitive photonic components and human vision from high-intensity laser radiation. In this context, this study reports the development of metal-based optical limiters by integrating copper nanoparticles into a silica matrix, offering an efficient platform for an enhanced nonlinear optical response. The nanocomposites were synthesized via the sol–gel route, and their structure and morphology were examined using X-ray diffraction and high-resolution transmission electron microscopy (HRTEM), respectively. The elemental composition and chemical state were analyzed by X-ray photoelectron spectroscopy, and the third-order nonlinear optical properties and optical-limiting performance were evaluated using the <i>Z</i>-scan technique. Copper nanoparticles introduce pronounced plasmon–matrix coupling within the silica host, enabling bandgap modulation and strong local electromagnetic field enhancement, which collectively promote efficient two-photon absorption and nonlinear optical responses. Plasmonic states at the metal–dielectric interface modulate charge transport and amplify excited-state absorption, yielding dominant reverse-saturable absorption and robust optical limiting properties. The nanocomposites exhibited an optical limiting threshold of 1.66&#xa0;Jcm⁻² at an input energy of 0.5&#xa0;mJ under 532&#xa0;nm excitation (5 ns, 10&#xa0;Hz). The results reveal a clear correlation between nonlinear absorption dynamics and plasmon-mediated charge transport, establishing copper-silica (Cu–SiO₂) nanocomposites as efficient platforms for photonic protection and laser-sensitive-sensor applications.</p>

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Enhanced Optical Limiting in Plasmonic Cu-Integrated Silica Nanocomposites

  • 期刊论文

  • 发表日期：

    2026年7月25日

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  • Suchithra S,
  • Vijayakumar Sadasivan Nair,
  • Saravana Kumar,
  • Vinoy Thomas,
  • Remya Muralimanohar,
  • Hubert Joe,
  • Alice Noble

摘要

Plasmon-engineered dielectric nanocomposites are promising materials for enhancing nonlinear optical (NLO) responses. With the rapid advancement of high-intensity laser technologies, there is a growing demand for efficient optical limiting systems to safeguard sensitive photonic components and human vision from high-intensity laser radiation. In this context, this study reports the development of metal-based optical limiters by integrating copper nanoparticles into a silica matrix, offering an efficient platform for an enhanced nonlinear optical response. The nanocomposites were synthesized via the sol–gel route, and their structure and morphology were examined using X-ray diffraction and high-resolution transmission electron microscopy (HRTEM), respectively. The elemental composition and chemical state were analyzed by X-ray photoelectron spectroscopy, and the third-order nonlinear optical properties and optical-limiting performance were evaluated using the Z-scan technique. Copper nanoparticles introduce pronounced plasmon–matrix coupling within the silica host, enabling bandgap modulation and strong local electromagnetic field enhancement, which collectively promote efficient two-photon absorption and nonlinear optical responses. Plasmonic states at the metal–dielectric interface modulate charge transport and amplify excited-state absorption, yielding dominant reverse-saturable absorption and robust optical limiting properties. The nanocomposites exhibited an optical limiting threshold of 1.66 Jcm⁻² at an input energy of 0.5 mJ under 532 nm excitation (5 ns, 10 Hz). The results reveal a clear correlation between nonlinear absorption dynamics and plasmon-mediated charge transport, establishing copper-silica (Cu–SiO₂) nanocomposites as efficient platforms for photonic protection and laser-sensitive-sensor applications.