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Strain-engineered rippling at the bilayer-MoS2 interface identified by advanced atomic force microscopy

  • Haoyu Dong,
  • Songyang Li,
  • Shuo Mi,
  • Jianfeng Guo,
  • Zhaxi Suonan,
  • Hanxiang Wu,
  • Yanyan Geng,
  • Manyu Wang,
  • Huiwen Xu,
  • Li Guan,
  • Fei Pang,
  • Wei Ji,
  • Rui Xu,
  • Zhihai Cheng

摘要

The van der Waals interface structures and behaviors are of great importance in determining the physical properties of two-dimensional atomic crystals and their heterostructures. The delicate interfacial properties are sensitively dependent on the mechanical behaviors of atomically thin films under external strain. Here, we investigated the strain-engineered rippling structures at the CVD-grown bilayer-MoS2 interface with advanced atomic force microscopy (AFM). The in-plane compressive strain is sequentially introduced into the 1L-substrate and 2L-1L interface of bilayer-MoS2 flakes via a fast-cooling process. The thermal strain-engineered rippling structures were directly visualized at the central 2H- and 3R-MoS2 bilayer regions with friction force microscopy (FFM) and bimodal AFM techniques. These rippling structures can be further artificially manipulated into the beating-like rippling features and fully erased via the contact mode AFM scanning. Our results shed lights on the strain-engineered interfacial structures of two-dimensional materials and also inspire the further investigation on the interface engineering of their electronic and optical properties.