Scholarlink

<p>Magnetorheological jet polishing is a non-contact, deterministic technique for ultra-precision fabrication of hard and brittle optical materials. To address efficiency and scalability, this work develops a dual-parameter material removal model through dimensional analysis, coupling jet pressure and dwell time for flexible tool influence function (TIF) adaptation. A parameter planning algorithm is then established to allocate dwell times among multiple TIFs, enabling fabrication of microlens arrays (MLAs) with varying feature-to-spot ratios. Experiments reveal controllable subunit geometry, stable optical parameters, and edge effects evolving from amplification in small arrays to attenuation or reversal in larger ones, in agreement with model predictions. The proposed model and algorithm provide stable topography control and optical optimization across multiple array scales, demonstrating effectiveness for large-scale MLA fabrication and potential applicability to planar, spherical, and aspherical optical surfaces.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Investigation of the dual-parameter material removal framework for coordinated multi-TIFs planning in magnetorheological jet polishing

  • 期刊论文

  • 发表日期：

    2026年6月30日

查看全文
  • Yulu Miao,
  • Yunpeng Feng,
  • Haobo Cheng,
  • Kangju Lin,
  • Yang Zhang,
  • Jiang Wu,
  • Kun Gao

摘要

Magnetorheological jet polishing is a non-contact, deterministic technique for ultra-precision fabrication of hard and brittle optical materials. To address efficiency and scalability, this work develops a dual-parameter material removal model through dimensional analysis, coupling jet pressure and dwell time for flexible tool influence function (TIF) adaptation. A parameter planning algorithm is then established to allocate dwell times among multiple TIFs, enabling fabrication of microlens arrays (MLAs) with varying feature-to-spot ratios. Experiments reveal controllable subunit geometry, stable optical parameters, and edge effects evolving from amplification in small arrays to attenuation or reversal in larger ones, in agreement with model predictions. The proposed model and algorithm provide stable topography control and optical optimization across multiple array scales, demonstrating effectiveness for large-scale MLA fabrication and potential applicability to planar, spherical, and aspherical optical surfaces.