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Enhanced fatigue resistance of ferroelectric Al0.65Sc0.35N deposited by physical vapor deposition

  • Yang Li,
  • Danyang Yao,
  • Yan Liu,
  • Zhi Jiang,
  • Ruiqing Wang,
  • Xu Ran,
  • Jiuren Zhou,
  • Qikun Wang,
  • Guoqiang Wu,
  • Genquan Han

摘要

In summary, our study has achieved successful growth of a ferroelectric Al0.65Sc0.35N film using the PVD method. The fabricated capacitors have demonstrated a coercive field of 2.70 MV/cm as well as an impressively large remnant polarization of 143 µC/cm2. Significantly, we have set a benchmark by achieving a remarkable 5 × 107 switching cycle without observable substantial degradation. This advancement represents a promising way to enhance fatigue resistance, which could push forward the practical applications of this technology in non-volatile, low-power, intelligent, and reconfigurable electronics.