<p>The current study investigates the effect of copper doping with concentrations ranging from 2 wt% to 10 wt% on cobalt oxide (Co<sub>3</sub>O<sub>4</sub>) properties and their application in photocatalytic reactions. Undoped and copper-doped Co<sub>3</sub>O<sub>4</sub> thin films were synthesized using the pyrolysis spray technique (PST) on a glass substrate at 400&#xa0;°C and with 0.2&#xa0;M. XRD analysis reveals that all substrates exhibited a single-phase, spinel cubic structure, indicating that incorporating copper (Cu) into the Co<sub>3</sub>O<sub>4</sub> structure did not form a new crystalline phase. An increase in crystallite size was observed, rising from 25.588 to 40.940&#xa0;nm. The micrograph of films was analyzed using scanning electron microscopy (SEM). UV–Vis measurements found that incorporating Cu-dopants reduced the direct band gap Eg<sub>2</sub> from 2.030 to 2.012. The photocatalytic efficiency of films was evaluated by measuring the degradation of methylene blue dye (MB) under sunlight irradiation for 4&#xa0;h. The kinetics of MB photodegradation were evaluated using the non-linear least square method. The optimal Cu-doping concentration is at 8 wt%, with the maximum degradation of MB being 84%. It concluded that incorporating copper markedly improves the photocatalytic performance of cobalt oxide thin films.</p>

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Impact of copper-doped cobalt oxide thin films on the photocatalytic degradation of methylene blue dye under sunlight irradiation

  • Sabah Haffas,
  • Nadjette Belhamra,
  • Zahia Bencharef,
  • Nourelhouda Redjouh,
  • Brahim Gasmi,
  • Sâad Rahmane

摘要

The current study investigates the effect of copper doping with concentrations ranging from 2 wt% to 10 wt% on cobalt oxide (Co3O4) properties and their application in photocatalytic reactions. Undoped and copper-doped Co3O4 thin films were synthesized using the pyrolysis spray technique (PST) on a glass substrate at 400 °C and with 0.2 M. XRD analysis reveals that all substrates exhibited a single-phase, spinel cubic structure, indicating that incorporating copper (Cu) into the Co3O4 structure did not form a new crystalline phase. An increase in crystallite size was observed, rising from 25.588 to 40.940 nm. The micrograph of films was analyzed using scanning electron microscopy (SEM). UV–Vis measurements found that incorporating Cu-dopants reduced the direct band gap Eg2 from 2.030 to 2.012. The photocatalytic efficiency of films was evaluated by measuring the degradation of methylene blue dye (MB) under sunlight irradiation for 4 h. The kinetics of MB photodegradation were evaluated using the non-linear least square method. The optimal Cu-doping concentration is at 8 wt%, with the maximum degradation of MB being 84%. It concluded that incorporating copper markedly improves the photocatalytic performance of cobalt oxide thin films.