Spectroscopic and electrical properties of polymer nanocomposite films based on PMMA/PVDF incorporated with silicon oxide (SiO₂) for promising electronic devices

Polymer nanocomposites consisting of polymethyl methacrylate/polyvinylidene fluoride (PMMA/PVDF) polymer doped with silicon oxide (SiO₂) nanopowders were prepared using solvothermal. The XRD and FT-IR measurements confirmed the chances of the structure of the PMMA/PVDF blend due to the addition of SiO₂. The IR intensity and XRD structural changes affirmed the miscibility and complexation between the pure blend PMMA/PVDF and the blend with SiO₂ NPs as a filler. The addition of SiO₂ causes a decrease and weakening of the intensity of the diffraction peaks of PMMA/PVDF indicating that the addition can gradually reduce the crystallinity of the composite films. The changes in the structural and optical properties caused a shift in the absorption edge toward a lower wavelength, which resulted in a drop in the energy gap value. The dielectric constant (ε′), dielectric loss (ε′′), the dielectric moduli (M′ and M′′), and the AC conductivity (σ_ac) were measured in the range of frequency from 0.1 to 10⁶ Hz. Increasing of the frequency resulted in lower estimates for both ε′ and ε′′. A charge-transfer complex was formed when SiO₂ NPs were incorporated into the PMMA/PVDF blend. The Cole–Cole plot, obtained using a non-Debye technique, exhibited a semicircular shape when plotting the values of M′ and M′′.