Investigation of n-ZnO/p-porous GaAs/p++-GaAs heterostructure for photodetection applications
摘要
In this work, we have investigated n-ZnO/p-porous GaAs/p++-GaAs heterostructure for low-cost photodetector applications. Solution-based deposition process was used to synthesize ZnO thin film on porous GaAs layer formed by anodic etching. Energy dispersive x-ray spectroscopy (EDX) was used for chemical characterization and revealed that the deposited ZnO film was oxygen rich. Scanning electron microscopy (SEM) analysis demonstrated a porous surface morphology of the ZnO film and the infiltration of a part of the deposited film inside the porous GaAs matrix. The transport mechanisms of the n-ZnO/p-porous_GaAs/p++-GaAs heterostructure were investigated via current–voltage (I–V) measurements in the dark at room temperature. I–V characteristic showed rectification behavior, and the maximum value of the rectification ratio is 53 at ± 1.78 V. A series resistance Rs = 15 Ω and an ideality factor, n = 8, were obtained by using the Cheung function. The Forward I–V curve in Log–Log scales follows a power law dependence characteristic of trap-assisted space charge limited conduction. In the reverse bias voltages, we found that the thermionic emission theory in the presence of an interface layer reproduces the current–voltage characteristic. A potential barrier height of