Effect of pulse repetition rate on laser synthesis of web-like agglomerated Si/SiOx nanoparticles
摘要
The fabrication of nanoparticles by sputtering a silicon target with 1 ps laser pulses in a standard air environment has been studied varying the pulse repetition rate in the range of 10 kHz–1 MHz. This range covers the interval between low (≤ 1 kHz) and ultrahigh (2–26 MHz) repetition rates, which were previously applied to produce nanoparticles using laser sputtering. It was found that high repetition rates (50 kHz–1 MHz) stimulate occurrence of fine nanoparticles with an average size of 5–10 nm, which aggregate predominantly into nanochains and form specific web-like structures similar to those reported earlier for multi-MHz laser ablation. Reducing the repetition rate to 10 kHz dramatically increases the spread in the particle sizes (from tens to hundreds of nanometers) and provokes chaotic three-dimensional coalescence of primary nanoparticles. An assumed permanent reduction of the ambient gas pressure near the laser ablation region irradiated with a high repetition rate is suggested as a possible reason for the identified trends in nanoparticle formation.