<p>Ferroelectric relaxors have been extensively investigated for energy storage applications in pulsed-power electronics owing to their low remnant polarization. Herein, a lead-free Ba(Zr<sub>0.3</sub>Ti<sub>0.7</sub>)O<sub>3</sub> (BZT) ferroelectric relaxor thin film was synthesized by a sol-gel method for energy storage application. It was found that the annealing temperature has a profound effect on the microstructure and the energy storage performance of the BZT thin film. Increasing annealing temperature promotes the burn-out of the organic residues as well as the densification of the thin films. However, excessive abnormal grain growth occurs at high annealing temperatures and leads to a reduced breakdown strength. Consequently, an optimized energy storage density of 51.4 J/cm<sup>3</sup> and energy storage efficiency of 73.4% are achieved in Ba(Zr<sub>0.3</sub>Ti<sub>0.7</sub>)O<sub>3</sub> thin film annealed at 850 °C with a thickness of 210 nm, which also shows high frequency stability (0.2–20 kHz), high temperature stability (25–140 °C) and long-term anti-fatigue stability up to 10<sup>7</sup> switching cycles. These results provide guidance to improve the energy storage performance of ferroelectric relaxor film capacitors for applications in advanced high power electronics.</p><p></p>

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Influence of the annealing temperature on the microstructure and energy storage performance in lead-free Ba(Zr0.3Ti0.7)O3 ferroelectric relaxor thin film

  • Wenwen Chen,
  • Feiyu Ren,
  • Xinle Ye,
  • Guoxiu Qiu,
  • Yunfei Liu,
  • Yinong Lyu,
  • Jin Luo

摘要

Ferroelectric relaxors have been extensively investigated for energy storage applications in pulsed-power electronics owing to their low remnant polarization. Herein, a lead-free Ba(Zr0.3Ti0.7)O3 (BZT) ferroelectric relaxor thin film was synthesized by a sol-gel method for energy storage application. It was found that the annealing temperature has a profound effect on the microstructure and the energy storage performance of the BZT thin film. Increasing annealing temperature promotes the burn-out of the organic residues as well as the densification of the thin films. However, excessive abnormal grain growth occurs at high annealing temperatures and leads to a reduced breakdown strength. Consequently, an optimized energy storage density of 51.4 J/cm3 and energy storage efficiency of 73.4% are achieved in Ba(Zr0.3Ti0.7)O3 thin film annealed at 850 °C with a thickness of 210 nm, which also shows high frequency stability (0.2–20 kHz), high temperature stability (25–140 °C) and long-term anti-fatigue stability up to 107 switching cycles. These results provide guidance to improve the energy storage performance of ferroelectric relaxor film capacitors for applications in advanced high power electronics.