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<p>MAPDST-based polymers have attracted attention in photoresist-related material design because of their radiation-responsive sulfonium structures. However, their relatively low glass transition temperature and limited solution processability remain important issues for further material development. To address this trade-off, two ternary copolymer systems, MAPDST-ADPMA-HEAA and MAPDST-ADPMA-2-EEA, were constructed on the basis of the MAPDST-ADPMA binary system, and the effects of third-comonomer type and feed ratio on polymer properties were systematically evaluated. Both target terpolymers were successfully prepared. Compared with 2-EEA, HEAA provided a better balance between solubility improvement and thermal-property retention. Further optimization identified MAPDST-ADPMA-HEAA (70:20:10) as the composition showing the best overall balance among the tested samples, with a <i>T</i><sub><i>g</i></sub> of 121&#xa0;°C and a thermal decomposition temperature of 242&#xa0;°C. Overall, the results suggest that introducing an appropriate polar third comonomer provides a feasible approach to improving the balance between solution processability, film-forming behavior, and thermal performance in MAPDST-based polymer systems. These results provide a basis for further structure–property optimization and subsequent lithographic evaluation.</p>

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Preparation and property optimization of MAPDST-based terpolymers for EUV photoresist-related polymer design

  • 期刊论文

  • 发表日期：

    2026年7月29日

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  • Jingyi Gan,
  • Chenyu Zheng,
  • Rui Wang,
  • Guomin Xiao

摘要

MAPDST-based polymers have attracted attention in photoresist-related material design because of their radiation-responsive sulfonium structures. However, their relatively low glass transition temperature and limited solution processability remain important issues for further material development. To address this trade-off, two ternary copolymer systems, MAPDST-ADPMA-HEAA and MAPDST-ADPMA-2-EEA, were constructed on the basis of the MAPDST-ADPMA binary system, and the effects of third-comonomer type and feed ratio on polymer properties were systematically evaluated. Both target terpolymers were successfully prepared. Compared with 2-EEA, HEAA provided a better balance between solubility improvement and thermal-property retention. Further optimization identified MAPDST-ADPMA-HEAA (70:20:10) as the composition showing the best overall balance among the tested samples, with a Tg of 121 °C and a thermal decomposition temperature of 242 °C. Overall, the results suggest that introducing an appropriate polar third comonomer provides a feasible approach to improving the balance between solution processability, film-forming behavior, and thermal performance in MAPDST-based polymer systems. These results provide a basis for further structure–property optimization and subsequent lithographic evaluation.