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<p>We report on short pulse deep ultraviolet (DUV) laser operating at 213 nm from an extracavity third harmonic generation (THG) of a&#xa0;passively Q‑switched (PQS) Pr:YLF laser. By compensating the thermal lens effect of the laser crystal and utilizing Co:MgAl<sub>2</sub>O<sub>4</sub> (MALO) as the saturable absorber (SA), we obtain the highest pulse output power at 213 nm generated from a&#xa0;PQS Pr:YLF laser by the method of THG. Under pumping with a&#xa0;fiber coupled blue laser diode, we realized 11.87 ns pulse width at a&#xa0;repetition rate of 11.95 kHz, with an average output power of 152.8 mW at 213 nm. This is the highest PQS pulse deep UV at 213 nm generated by extracavity third harmonic generation of a&#xa0;passively Q‑switched Pr:YLF laser.</p>

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Extracavity third-harmonic generation at 213 nm of a passively Q-switched Pr:YLF laser

  • 期刊论文

  • 发表日期：

    2026年6月22日

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  • Yi Yao,
  • Yue Zhao,
  • Jidong Li,
  • Chuanbo Wang,
  • Fang Ma,
  • Wei Dou,
  • Quan Zheng

摘要

We report on short pulse deep ultraviolet (DUV) laser operating at 213 nm from an extracavity third harmonic generation (THG) of a passively Q‑switched (PQS) Pr:YLF laser. By compensating the thermal lens effect of the laser crystal and utilizing Co:MgAl2O4 (MALO) as the saturable absorber (SA), we obtain the highest pulse output power at 213 nm generated from a PQS Pr:YLF laser by the method of THG. Under pumping with a fiber coupled blue laser diode, we realized 11.87 ns pulse width at a repetition rate of 11.95 kHz, with an average output power of 152.8 mW at 213 nm. This is the highest PQS pulse deep UV at 213 nm generated by extracavity third harmonic generation of a passively Q‑switched Pr:YLF laser.