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High Energy X-Ray Source Characterization at 0.450, 3, 6, 9, and 15 MVp

  • David Hellmann,
  • Michael Liesenfelt,
  • Jason P. Hayward

摘要

As the availability and importance of high energy X-ray sources grows, accurate source characterizations provide critical information for field flatness corrections, beam hardening corrections, detector response corrections, and radiation shielding assessments. This study uses MCNP6.2 to create accurate high definition angular and energy dependent X-ray source definitions for the most common high energy industrial X-ray sources at 450 kVp, 3 MVp, 6 MVp, 9 MVp, and 15 MVp.