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<p>Based on conducted experiments, causes have been found for distorting the shape of the ion flux pulse supplied to the substrate in a laser plasma source for applying nanocoatings at low accelerating potentials; ways of their elimination are suggested. The design capacity of a laser plasma source, which is ~40 nF, has been determined, which is important for the conduct of subsequent experiments. It is shown that in eliminating the ion current pulse- shape distortion, a more uniform ion flow is supplied to the substrate surface, which results in an increase of the efficiency of the process of applying thin uniform nanocoatings.</p>

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Dynamics of Charges of Electron and Ion Flows in a Laser Plasma Source for the Formation of Nanostructures

  • 期刊论文

  • 发表日期：

    2025年7月1日

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  • V. K. Goncharov,
  • M. V. Puzyrev

摘要

Based on conducted experiments, causes have been found for distorting the shape of the ion flux pulse supplied to the substrate in a laser plasma source for applying nanocoatings at low accelerating potentials; ways of their elimination are suggested. The design capacity of a laser plasma source, which is ~40 nF, has been determined, which is important for the conduct of subsequent experiments. It is shown that in eliminating the ion current pulse- shape distortion, a more uniform ion flow is supplied to the substrate surface, which results in an increase of the efficiency of the process of applying thin uniform nanocoatings.