Design of a High-Performance WO3/g-C3N4 Z-Scheme Photocatalyst for Effective Phenol Degradation and Antibacterial Activity
摘要
An innovative Z-scheme WO3/g-C3N4 composite was efficiently produced via a straightforward hydrothermal method and applied to the photodegradation of phenol. The physiochemical behaviours of WO3, g-C3N4, WO3/g-C3N4 composite was analyzed by various analytical instruments. Compared to WO3, g-C3N4 single counterparts WO3/g-C3N4 Composite exhibits superior charge carriers’ separation efficiency and also Z scheme mechanism promoted the superior pollutant degradation. Subsequently, the WO3/g-C3N4 composite achieving 93% with rate constant 0.0184 min− 1 phenol removal within 100 min. The noteworthy increased photocatalytic bustle of WO3/g-C3N4 composite was attributed to the synergetic effect between the boundary of WO3/g-C3N4. Curiously, WO3/g-C3N4 composite validates exceptional photostability during reusable experiment, accentuating its potential as a functioning photocatalyst for phenol removal. The antimicrobial tests showed that the developed photocatalyst effectively sterilizes both gram-positive Staphylococcus aureus and gram-negative Escherichia coli. Thus, the WO3/g-C3N4 nanocomposites are robust materials suitable for use as antimicrobial agents and photocatalysts activated by sunlight.