<p>The microstructure evolution, properties, and lifetime of Sn2.5Ag0.7Cu0.1RE/Cu solder joints under ideal electromigration conditions were systematically investigated. The results show that intermetallic compounds (IMCs) at the anode and cathode interfaces exhibit asymmetric growth during electromigration. At the anode, the Cu<sub>6</sub>Sn<sub>5</sub> IMC transforms from a thin scallop-like morphology into a thicker, flatter layered structure with dispersed granular Ag<sub>3</sub>Sn particles, while a thin Cu<sub>3</sub>Sn layer forms on the Cu substrate side. In contrast, the Cu<sub>6</sub>Sn<sub>5</sub> IMC at the cathode gradually dissolves from its initial scallop-like morphology. The crystallographic orientation of β-Sn grains in the solder matrix plays a key role in IMC evolution. When the current density reaches or exceeds 0.7 × 10<sup>4</sup> A/cm<sup>2</sup>, the β-Sn grain orientation changes significantly. With increasing current density, the misorientation among β-Sn grains increases, resulting in more pronounced asymmetry in interfacial IMC growth. The median time to failure (MTTF) is used to evaluate the service life of the solder joints under electromigration. With prolonged current loading, micro-voids at the cathode coalesce and grow, leading to increased electrical resistance and decreased shear strength. Meanwhile, the fracture mode changes from ductile fracture with small equiaxed dimples to brittle quasi-cleavage fracture at the Cu<sub>6</sub>Sn<sub>5</sub>/Cu<sub>3</sub>Sn interface.</p>

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Microstructural evolution, properties, and failure behavior of Sn2.5Ag0.7Cu0.1RE/Cu solder joints under electromigration conditions

  • Haizhou Zhang,
  • Keke Zhang,
  • Yanzhen Zhang,
  • Wenjia Zhao,
  • Fupeng Huo,
  • Chao Zhang

摘要

The microstructure evolution, properties, and lifetime of Sn2.5Ag0.7Cu0.1RE/Cu solder joints under ideal electromigration conditions were systematically investigated. The results show that intermetallic compounds (IMCs) at the anode and cathode interfaces exhibit asymmetric growth during electromigration. At the anode, the Cu6Sn5 IMC transforms from a thin scallop-like morphology into a thicker, flatter layered structure with dispersed granular Ag3Sn particles, while a thin Cu3Sn layer forms on the Cu substrate side. In contrast, the Cu6Sn5 IMC at the cathode gradually dissolves from its initial scallop-like morphology. The crystallographic orientation of β-Sn grains in the solder matrix plays a key role in IMC evolution. When the current density reaches or exceeds 0.7 × 104 A/cm2, the β-Sn grain orientation changes significantly. With increasing current density, the misorientation among β-Sn grains increases, resulting in more pronounced asymmetry in interfacial IMC growth. The median time to failure (MTTF) is used to evaluate the service life of the solder joints under electromigration. With prolonged current loading, micro-voids at the cathode coalesce and grow, leading to increased electrical resistance and decreased shear strength. Meanwhile, the fracture mode changes from ductile fracture with small equiaxed dimples to brittle quasi-cleavage fracture at the Cu6Sn5/Cu3Sn interface.