Charged particle detection using Al2O3-passivated Ni/(n)4H-SiC Schottky diodes
摘要
Aluminum oxide (Al2O3) passivation of highly crystalline n-type 4H-SiC epitaxial layer was achieved using pulsed laser deposition, yielding highly rectifying devices without requiring post-deposition annealing. Large-area Ni/Al2O3/4H-SiC Schottky-type diodes fabricated on the passivated epilayers exhibited an effective barrier height of 1.3 eV. Capacitance–voltage measurements performed at 1 MHz revealed a flat-band potential of 2.3 V, indicating the presence of fixed oxide charge in the Al2O3 layer. Frequency-dependent capacitance measurements further showed that slow interface states do not significantly perturb device behavior, confirming effective surface passivation. These interface characteristics enable efficient self-biased operation (0 V applied bias), yielding an energy resolution of 3.3% for 5.486 MeV alpha particles, while an optimized reverse bias of − 40 V results in a high energy resolution of 0.5%. Deep-level transient spectroscopy measurements identified Z1/2 electron traps as the dominant factor limiting the ultimate energy resolution. The deeper traps consistent with oxidation-induced defects are unlikely to significantly influence the room-temperature detector performance under the present experimental conditions. The results demonstrate that Al2O3 passivation provides a low-cost and effective route to enabling high-resolution, self-biased radiation detection in 4H-SiC devices, suitable for radiation monitoring in space and nuclear reactor core environments.