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<p>This review provides a comprehensive assessment of recent progress in metal oxide–based display technologies, focusing on sputtering target materials and their functional properties. Particular attention is given to indium gallium zinc oxide (IGZO), widely regarded as the benchmark semiconductor due to its high carrier mobility and optical transparency. Challenges associated with the high cost and limited supply of indium and gallium are examined, highlighting Zinc Tin Oxide (ZTO) as a promising alternative owing to its elemental abundance, environmental compatibility, and ability to form high-quality ceramic sputtering targets through advanced synthesis routes, including hydrothermal processing. By linking fabrication strategies to structural, optical, and electronic properties, this review evaluates how processing parameters influence device performance. The study emphasizes the importance of developing scalable, indium-free sputtering target materials aligned with industrial manufacturing requirements and global sustainability goals.</p>

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Recent trends in metal oxide TFT technologies: sputtering targets, manufacturing routes, and material properties

  • 期刊论文

  • 发表日期：

    2026年3月27日

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  • Cem Aciksari,
  • Ender Suvaci

摘要

This review provides a comprehensive assessment of recent progress in metal oxide–based display technologies, focusing on sputtering target materials and their functional properties. Particular attention is given to indium gallium zinc oxide (IGZO), widely regarded as the benchmark semiconductor due to its high carrier mobility and optical transparency. Challenges associated with the high cost and limited supply of indium and gallium are examined, highlighting Zinc Tin Oxide (ZTO) as a promising alternative owing to its elemental abundance, environmental compatibility, and ability to form high-quality ceramic sputtering targets through advanced synthesis routes, including hydrothermal processing. By linking fabrication strategies to structural, optical, and electronic properties, this review evaluates how processing parameters influence device performance. The study emphasizes the importance of developing scalable, indium-free sputtering target materials aligned with industrial manufacturing requirements and global sustainability goals.