Comparative optoelectronic evaluation of CuS-based thin-film p–n junction photodiodes on ATO, FTO, and ZnO substrates fabricated via spray pyrolysis
摘要
In this research, thin-film p–n junction photodiodes were fabricated using CuS as the p-type layer combined with different n-type substrates (ATO, FTO, and ZnO) through spray pyrolysis, and their optoelectronic properties were systematically examined. Comprehensive structural, surface, optical, and electrical analyses confirmed that the p-CuS/n-ATO device delivered the best overall performance among the tested configurations. The diode achieved a maximum photosensitivity of 3.71 × 104%, responsivity of 92.92 mAW−1, quantum efficiency of 48.09%, and specific detectivity of 1.9 × 1011 Jones at 1 V bias. These values are considerably higher than those reported for other metal-sulfide-based photodetectors. The superior behavior is mainly attributed to favorable band alignment, reduced carrier recombination, and efficient charge transport across the CuS/ATO interface. The findings demonstrate that ATO functions as a highly effective n-type electrode, ensuring stable junction formation and low-noise operation. Overall, the study highlights the promise of CuS/ATO heterostructures for high-sensitivity photodetection and scalable optoelectronic device development.