Tuneable structural and optical properties of two-electrode electrodeposited V2O5 nanostructured thin films via Mo and Nb co-doping for optoelectronic applications
摘要
The incorporation of molybdenum and niobium into V2O5 thin films was investigated to enhance their suitability for transparent oxide structures in optoelectronic applications. The films were deposited at different dopant concentrations (0.01 - 0.02 mol.L−1) from a simple solution growth process, employing two-electrode electrochemical deposition technique. Morphological and structural analyses using scanning electron microscopy and X-ray diffraction confirmed polycrystalline growth, dopant-induced refinement, and redistribution of grains. The doped films exhibited tunable optical constants which include refractive index, extinction coefficient, and optical conductivity, depending on dopant type and concentration. These optical characteristics demonstrate that controlled Mo and Nb incorporation can influence photon absorption and light–matter interaction in V₂O₅ thin films, indicating their potential use in next-generation optoelectronic devices.