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<p>This study investigates the photoconductive response of Au-doped TiO₂ thin films under ultraviolet (UV) illumination, with a focus on changes in electrical resistance as a detection mechanism. Thin films with varying gold nanoparticle distributions—on the surface and within the TiO₂ matrix—were fabricated using magnetron sputtering and thermal oxidation techniques. Under UV exposure, all Au-doped samples exhibited a significant, rapid, and reversible decrease in resistance, attributed to the generation of photoinduced charge carriers in TiO₂ and localized surface plasmon resonance (LSPR) effects from the incorporated Au nanoparticles. Among the samples, the configurations with Au located at the surface (Top-Au) and embedded within the film (Mid-Au) exhibited the most efficient photo response. Best response values, sensitivity are 6.8% and 6.5%, rise/fall times are 0.48/0.12 and 0.38/0.29 for Mid-Au and Top-Au, respectively. The results confirm that resistance modulation in these nanostructured films provides a reliable, low-power approach for real-time UV photodetection. This work highlights the potential of plasmon-enhanced oxide semiconductors in the development of next-generation optoelectronic sensors.</p>

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Phase engineering and UV photoresponse of TiO₂ films on Si substrates modified with spatially distributed Au nanoparticles

  • 期刊论文

  • 发表日期：

    2026年1月8日

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  • Hoda Enayati-Taloobaghi ,
  • Sadegh Soltani,
  • Mohammad Mahdi Shahidi,
  • Esmaeil Salahi

摘要

This study investigates the photoconductive response of Au-doped TiO₂ thin films under ultraviolet (UV) illumination, with a focus on changes in electrical resistance as a detection mechanism. Thin films with varying gold nanoparticle distributions—on the surface and within the TiO₂ matrix—were fabricated using magnetron sputtering and thermal oxidation techniques. Under UV exposure, all Au-doped samples exhibited a significant, rapid, and reversible decrease in resistance, attributed to the generation of photoinduced charge carriers in TiO₂ and localized surface plasmon resonance (LSPR) effects from the incorporated Au nanoparticles. Among the samples, the configurations with Au located at the surface (Top-Au) and embedded within the film (Mid-Au) exhibited the most efficient photo response. Best response values, sensitivity are 6.8% and 6.5%, rise/fall times are 0.48/0.12 and 0.38/0.29 for Mid-Au and Top-Au, respectively. The results confirm that resistance modulation in these nanostructured films provides a reliable, low-power approach for real-time UV photodetection. This work highlights the potential of plasmon-enhanced oxide semiconductors in the development of next-generation optoelectronic sensors.