Investigation of the growth, structural, and physicochemical properties of bis (15-crown-5-k5O) strontium tetrakis (isothiocyanato-kN) cobalt (II) single crystal for NLO and optical limiting applications
摘要
Nonlinear optical (NLO) single crystals of Bis (15-Crown-5-k5O) Strontium tetrakis (isothiocyanate-kN) Cobalt (II) [BSRCOTC] were successfully grown at ambient temperature using a mixed solvent of de-ionized water, methanol and 1,2 dichloroethane via the slow evaporation method. The crystal structure was confirmed through single-crystal X-ray diffraction, revealing a monoclinic system with a centrosymmetric structure in the space group C2/c. The crystalline nature was further verified by powder X-ray diffraction, with obtained peaks compared to CIF data. Chemical bonding was investigated using FTIR and Micro-Raman spectroscopy. Optical studies showed a cut-off wavelength of 366 nm and a band gap of 3.03 eV, as determined from Tauc’s plot in UV–Visible–NIR analysis. Chemical etching studies revealed reverse growth rates and a layered etch pattern, calculated EPD value is 2 × 105 cm−2. Thermal properties were assessed through TG–DTA analysis taken, TG stable up to 168 °C and confirmed by no phase changes. This stability shows that the material behaves well as a crystal. DTA curve has two endothermic peaks at 189 °C and 317 °C. The initial of decomposition around at 189 °C, presumably the presence of dibenzo15-Crown-5 and Co (NH4SCN) and temperature 317 °C. Vickers hardness testing indicating the material as soft (n = 4.7) suitable characteristics for device fabrication. Z-scan measurements determined that BSRCOTC exhibits two-photon absorption-induced optical limiting, with a nonlinear absorption coefficient of 1.02 × 10⁻1⁰ m/W and an onset optical limiting threshold of 1.79 × 1012 W/m2. The results suggest that BSRCOTC crystals exhibit favorable transmittance, moderate thermal and mechanical properties, and significant third-order susceptibility, positioning them as potential materials for NLO and optical limiting applications.