Electronic respond of Au/n-Si Schottky barrier diodes with PVP interlayer doped by Nd2O3 particles
摘要
This study looks at the effects of neodymium oxide (Nd2O3) nanoparticles doped in the polyvinyl pyrrolidone (PVP) thin film that sits between a metal and a semiconductor on the electrical characteristics and conduction mechanism of Schottky Barrier Diodes (SBDs). A microwave-assisted technique is employed to create the Nd2O3 nanostructure. The processed Nd2O3 nanostructure’s mean crystalline scale, surface morphology, pureness, and optical characteristics are ascertained by X-ray diffraction pattern, Field Emission-Scanning Electron Microscopy, Electron-Dispersive X-ray analysis, and ultraviolet–visible spectroscopy, respectively. By measuring the I–V characteristics at ± 3.8 V and comparing them, the Thermionic Emission, modified Norde technique, and Cheung functions are applied for calculating the main electronic variables of prepared SBDs including the ideality coefficient (n), leak current (I0), the height measure of electric potential barrier (