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<p>Ag/AZO films with different Ag layer thickness (abbreviated as Ag(x)/AZO) are prepared using RF magnetron sputtering to investigate the optical, electrical and electromagnetic shielding properties. The figure of merit (<i>FoM</i>) gradually rises to a maximum and then declines with increasing Ag layer thickness due to the unique three-dimensional island growth mode of Ag layer. A highest <i>FoM</i> value of 0.0313&#xa0;Ω<sup>−1</sup> with a transmittance value of 82.9% is achieved at Ag(12&#xa0;nm)/AZO film. The obtained lower sheet resistance (<i>R</i><sub>sh</sub>: 4.950&#xa0;Ω/sq) makes it have an optimal average electromagnetic interference shielding effectiveness of 27.1&#xa0;dB in 1 ~ 10&#xa0;GHz. Meanwhile, the maximum <i>R</i><sub>sh</sub> change rate of Ag(12&#xa0;nm)/AZO film (7.61%) is smaller than that of commercial ITO (18.67%) when films are placed in 100–300&#xa0;℃ for 30&#xa0;min at atmospheric environment. These characteristics indicate that Ag(12&#xa0;nm)/AZO film is suitable for using in electromagnetic shielding field.</p>

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Synthesis and analysis of optical, electrical and electromagnetic shielding properties of Ag/AZO films

  • 期刊论文

  • 发表日期：

    2025年3月10日

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  • Yongdong Zhang,
  • Haoran Zheng,
  • Pan Yang,
  • Shihui Yu

摘要

Ag/AZO films with different Ag layer thickness (abbreviated as Ag(x)/AZO) are prepared using RF magnetron sputtering to investigate the optical, electrical and electromagnetic shielding properties. The figure of merit (FoM) gradually rises to a maximum and then declines with increasing Ag layer thickness due to the unique three-dimensional island growth mode of Ag layer. A highest FoM value of 0.0313 Ω−1 with a transmittance value of 82.9% is achieved at Ag(12 nm)/AZO film. The obtained lower sheet resistance (Rsh: 4.950 Ω/sq) makes it have an optimal average electromagnetic interference shielding effectiveness of 27.1 dB in 1 ~ 10 GHz. Meanwhile, the maximum Rsh change rate of Ag(12 nm)/AZO film (7.61%) is smaller than that of commercial ITO (18.67%) when films are placed in 100–300 ℃ for 30 min at atmospheric environment. These characteristics indicate that Ag(12 nm)/AZO film is suitable for using in electromagnetic shielding field.