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<p>The Stöber method is an effective sol–gel technique that produces conformal silica (SiO<sub>2</sub>) coatings. In the present manuscript, SiO<sub>2</sub> thin films have been synthesised using the sol–gel-based Stober method and deposited on glass substrates using the spin coating technique. Additionally, the effects of ammonia concentration on the structural, morphological, optical, and wetting characteristics of silica thin films have been investigated. X-ray diffraction analysis verified a broad peak around 24.1° that confirms the presence of an amorphous silica phase for all thin film samples. Elemental analysis illustrated the presence of Si and O elements in the sample without any impurity. Field Emission scanning microscope images depict uniformly distributed spherical shape silica nanoparticles with an average diameter of around 264&#xa0;nm. The variation of the optical bandgap of silica thin films prepared at different ammonia concentrations was investigated via UV-Vis spectrum. The band gap energy decreased from 3.67 to 3.50&#xa0;eV. The wetting properties of silica thin films have been studied from the contact angle measurement concerning variation in ammonia concentration. The objective of the current research work is the optimization of significant growth parameters for the fabrication of silica nanoparticles and their impact on wettability analysis to develop a superhydrophobic surface in future applications.</p>

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Exploration of impact of ammonia concentration on the surface morphology, optical and wettability performance of SiO2 thin film

  • 期刊论文

  • 发表日期：

    2025年2月12日

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  • K. Pradhan,
  • T. Badapanda,
  • J. Roy,
  • S. P. Ghosh

摘要

The Stöber method is an effective sol–gel technique that produces conformal silica (SiO2) coatings. In the present manuscript, SiO2 thin films have been synthesised using the sol–gel-based Stober method and deposited on glass substrates using the spin coating technique. Additionally, the effects of ammonia concentration on the structural, morphological, optical, and wetting characteristics of silica thin films have been investigated. X-ray diffraction analysis verified a broad peak around 24.1° that confirms the presence of an amorphous silica phase for all thin film samples. Elemental analysis illustrated the presence of Si and O elements in the sample without any impurity. Field Emission scanning microscope images depict uniformly distributed spherical shape silica nanoparticles with an average diameter of around 264 nm. The variation of the optical bandgap of silica thin films prepared at different ammonia concentrations was investigated via UV-Vis spectrum. The band gap energy decreased from 3.67 to 3.50 eV. The wetting properties of silica thin films have been studied from the contact angle measurement concerning variation in ammonia concentration. The objective of the current research work is the optimization of significant growth parameters for the fabrication of silica nanoparticles and their impact on wettability analysis to develop a superhydrophobic surface in future applications.