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Voltage controlled magnetic properties and perpendicular magnetic anisotropy of Co2FeSi alloy thin films

  • Jiaming Mei,
  • Jagadish Kumar Galivarapu,
  • Shangqian Wang,
  • Buyun Huang,
  • K. Kamala Bharathi,
  • Ke Wang

摘要

A series of Pt/Co2FeSi/MgAl2O4/Pt thin films with Co2FeSi thicknesses ranging from 4.5 to 6 nm are constructed to evaluate the influence of applied voltage on magnetic coercivity. It is found that the change in coercivity is around 50.04% at an applied voltage of 16 V for a 5.5 nm thin film, but increases significantly to 72.24% for a 6 nm thin film. We show evolution of perpendicular magnetic anisotropy (PMA) properties of Co2FeSi amorphous thin films with varying thickness. The polarization of External Hall Effect (EHE) and Magneto-Optic Kerr Effect (MOKE) loops match well with magnetic hysteresis. The EHE coefficient Rs rises from 2.0 × 10–10 to 5.5 × 10–10 Ω cm/G with increase in thickness from 4 nm to 6.5 nm, respectively. The voltage controlled the magnetic properties of Co2FeSi thin films might be beneficial in the development of low-power magnetic tunnel junctions [MTJs].