Influence of light intensity on the performance of CdS thin-film photoelectrochemical cells
摘要
The following study depicts the effect of light intensity on the performance of CdS thin-film photoelectrochemical cells. The thin films exhibit strong absorbance over the UV and visible regions, with an absorption edge located at approximately 510 nm, corresponding to the bulk CdS directly exhibiting a bandgap. The bandgap of approximately 2.46 eV obtained by the Tauc plot analysis is in agreement with known values and is very important for the optimization of the optoelectronic properties of the material. This calculation of d values is obtained from the XRD pattern. From the measurements, it was found that the crystallite size varied in the range of 25–30 nm. These SEM images show the surface morphology of the film, which confirmed its homogeneity with large agglomerates of CdS, in which nanosized particles were embedded. The n-type semiconducting nature of the films is thus confirmed by J–V measurements under illumination with different light intensities (