Comparison of electrical characteristics of aerosol-deposited Ga2O3/4H-SiC heterojunctions as a function of thickness
摘要
Ga2O3/4H-SiC heterojunction diodes were fabricated by depositing Ga2O3 thin films on 4H-SiC substrates using aerosol deposition (AD). X-ray diffraction (XRD) analysis showed that all Ga2O3 peaks increased with increasing oxide thickness. Scanning electron microscopy (SEM) was performed to confirm grain size and deposited area. The I–V curves showed relevance between oxide thickness and electrical properties. For these thin films, the 1200 nm sample shows low Vth among them. It was confirmed that the Ron,sp value and the On-state current increased as the oxide thickness increased.