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<p>Achieving simultaneous improvements in dielectric constant (<i>ε</i><sub>r</sub>) and breakdown strength (<i>E</i><sub>b</sub>) is challenging for all organic composite dielectric films. Here, a UV-photocrosslinked multilayer sandwich film (HFMA/PVDF-β-CD/PVDF–HFMA/PVDF) is designed, where the outer HFMA/PVDF layers act as high insulation barriers and the middle β-CD/PVDF layer enhances polarization. UV crosslinking enables synergistic control of interfacial polarization and micromechanical behavior. Interfacial polarization raises <i>ε</i><sub>r</sub> to 9.01 at 100&#xa0;Hz for the 10&#xa0;wt% HP-β sample. The crosslinked network suppresses carrier migration, lowers dielectric loss, and yields the minimum loss at 1 MHz for the 30 wt% HP-β film. With fluorine incorporation and crosslinking, breakdown strength reaches 579.55 MV/m (~ 160% of neat PVDF), and the Weibull shape parameter β increases to 33.01, indicating markedly improved reliability versus single-layer films. The 20&#xa0;wt% HP-β film achieves an energy storage density of 9.78&#xa0;J/cm<sup>3</sup> (~ 212% of PVDF) with 60.6% efficiency at 550&#xa0;MV/m. Overall, the multilayer architecture redistributes electric field stress and suppresses charge injection, offering a practical route to high energy density, reliable all organic dielectrics.</p>

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β-cyclodextrin-incorporated photocrosslinked sandwich-structured fluoropolymer films for high-performance dielectric energy storage

  • 期刊论文

  • 发表日期：

    2026年6月23日

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  • Hongwei Lu,
  • Yuxuan Huang,
  • Ming Wang,
  • Shijia Yang,
  • Weitao Su

摘要

Achieving simultaneous improvements in dielectric constant (εr) and breakdown strength (Eb) is challenging for all organic composite dielectric films. Here, a UV-photocrosslinked multilayer sandwich film (HFMA/PVDF-β-CD/PVDF–HFMA/PVDF) is designed, where the outer HFMA/PVDF layers act as high insulation barriers and the middle β-CD/PVDF layer enhances polarization. UV crosslinking enables synergistic control of interfacial polarization and micromechanical behavior. Interfacial polarization raises εr to 9.01 at 100 Hz for the 10 wt% HP-β sample. The crosslinked network suppresses carrier migration, lowers dielectric loss, and yields the minimum loss at 1 MHz for the 30 wt% HP-β film. With fluorine incorporation and crosslinking, breakdown strength reaches 579.55 MV/m (~ 160% of neat PVDF), and the Weibull shape parameter β increases to 33.01, indicating markedly improved reliability versus single-layer films. The 20 wt% HP-β film achieves an energy storage density of 9.78 J/cm3 (~ 212% of PVDF) with 60.6% efficiency at 550 MV/m. Overall, the multilayer architecture redistributes electric field stress and suppresses charge injection, offering a practical route to high energy density, reliable all organic dielectrics.