ITO nanorod-driven enhancement of current density in a-Si based p-i-n solar cells
摘要
The fabrication of sputtered indium tin oxide (ITO) nanorod arrays offers a promising and economical approach to improving light management in photovoltaic devices. In this study, we introduce a novel light-trapping approach using a sputtered ITO nanorod array as a substitute for traditional surface texturing. We successfully fabricated a hydrogenated amorphous silicon (a-Si:H) p-i-n solar cell on the ITO nanorod substrate and compared its performance to a standard reference device. The ITO nanorods, grown at 320 °C, exhibited excellent optical properties, with a diffused-to-total transmitted light ratio exceeding 50% at 400 nm and over 20% at 800 nm, indicating effective scattering across a broad spectral range. The nanorod-driven a-Si:H solar cell, using a significantly thinner intrinsic absorber layer of just 150 nm (compared to the conventional 300 nm), achieved a power conversion efficiency of 4.97%. Furthermore, it achieved a notable short-circuit current density (Jsc) of 12.07 mA/cm2, significantly exceeding that of the planar reference device. These results evidently validate the effectiveness of ITO nanorod arrays in enhancing light absorption and charge collection and highlight their potential as an advanced front transparent conductive oxide (TCO) architecture for advanced silicon-based thin-film solar cells.