Analyzing the Effectiveness of Various NMOS Layouts for Total Ionizing Dose Hardening in 180nm CMOS
摘要
This study evaluates the radiation tolerance of unconventional NMOS transistor layouts against the conventional design. Using a 3D TCAD simulator, we analyzed the performance parameters of various layouts, including off-state leakage current, on-state current, saturation voltage, threshold voltage, trans-conductance and output resistance. Four NMOS devices, each with a distinct layout (conventional, edge-less(ELT), H-type, and Z-type), were fabricated using SCL’s 180nm process and subjected to total ionization dose (TID) testing up to 300K rad. Our findings demonstrate that the H-type layouts exhibit comparable TID tolerance to the edge-less layout. Z type layout is useful up to 100k rad radiation tolerance. These results offer valuable guidance to designers seeking to optimize design of analog/mixed-signal integrated circuits using radiation-hardened by design(RHBD) technique.